1.

国際会議録
国際会議録
1. Advanced Silicon Wafers for 0.18 μm Design Rule and Beyond: Epi and fFLASH!
Schmolke,R. ; Blietz,M. ; Schauer,R. ; Zemke,D. ; Oelkrug,H. ; Ammon,W.v. ; Lambert,U. ; Graf,D.
出版情報: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.3-18,  2000.  Pennington, N.J., Bellingham, Wash..  Electrochemical Society — SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4218
2.

国際会議録
国際会議録
2. Defects in as-grown silicon and their evolution during beat treatments
Vanhellemont,J. ; Doruberger,E. ; Esfandyari,J. ; Kissinger,G. ; Trauwaert,M.-A. ; Bender,H. ; Graf,D. ; Lambert,U. ; Ammon,W.von
出版情報: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part1  pp.341-346,  1997.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 258-263
3.

国際会議録
国際会議録
3. Morphology of silicon wafer surfaces:a comparative study with stomic force microscopy and other techniques
Wagner,P. ; Gerber,H.A. ; Graf,D. ; Schmolke,R. ; Suhren,M.
出版情報: Flatness, roughness, and discrete defect characterization for computer disks, wafers, and flat panel displays : 8-9 August 1996, Denver, Colorado.  pp.18-27,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2862
4.

国際会議録
国際会議録
4. Lattice Defects in High Quality As-Grown CZ Silicon,Studied with Light Scattering and Preferential Etching Techniques
Vanhellemont,J. ; Kissinger,G. ; Graf,D. ; Kenis,K. ; Depas,M. ; Mertens,P. ; Lambert,U. ; Heyns,M. ; Claeys,C. ; Richter,H. ; Wagner,P.
出版情報: Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995.  pp.1755-1760,  1995.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 196-201