1.

国際会議録
国際会議録
1. The Effect of Carbon/Self-Interstitial Clusters on Carbon Diffusion in Silicon Modeled by Kinetic Monte Carlo Simulations
Pinacho, Ruth ; Jaraiz, Martin ; Gossmann, Hans J. ; Gilmer, George H. ; Benton, Janet L. ; Werner, P.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B7.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
2.

国際会議録
国際会議録
2. Antimony Clustering Due To High-Dose Implantation
Kalyanaraman, Ramki ; Haynes, Tony E. ; Venezia, Vincent C. ; Jacobson, Dale C. ; Gossmann, Hans J. ; Rafferty, Conor S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B8.5-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
3.

国際会議録
国際会議録
3. Calibration Of The Au Labeling Technique To Measure Vacancy Defects In Si
Kalyanaraman, Ramki ; Haynes, Tony E. ; Jacobson, Dale C. ; Gossmann, Hans J. ; Rafferty, Conor S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B9.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
4.

国際会議録
国際会議録
4. Atomistic Modelling of Point and Extended Defects in Crystalline Materials
Jaraiz, Martin ; Pelaz, Lourdes ; Rubio, Emiliano ; Barbolla, Juan ; Gilmer, George H. ; Eaglesham, David J. ; Gossmann, Hans J. ; Poate, John M.
出版情報: Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.43-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 532