1.

国際会議録
国際会議録
1. Atomic-Scale Imaging of Dopant Atom Distributions Within Silicon 5-Doped Layers
Citrin, P. H. ; Gossmann, H. J. ; Muller, D. A. ; Silcox, J. ; Vanfleet, R.
出版情報: Advances in materials problem solving with the electron microscope : symposium held November 30-December 3, 1999, Boston, Massachusetts, U.S.A..  pp.173-178,  2001.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 589
2.

国際会議録
国際会議録
2. Properties of Point-Defects in Si for Process Modeling
Gossmann, H. J. ; Rafferty, C. S. ; Stolk, P. A. ; Eaglesham, D. J. ; Gilmer, G. H. ; Poate, J. M. ; Vuong, H.-H. ; Mogi, T. K. ; Thompson, M. O.
出版情報: Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.3-,  1995.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 389