1.

国際会議録
国際会議録
1. DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI
Hillmann, F. ; Dobereiner, S. ; Gittinger, C. ; Reiter, R. ; Falk, G. ; Bruck, H.-J. ; Scheuring, G. ; Bosser, A. ; Heiden, M. ; Hoppen, G. ; Sulik, W. ; Voilrath, W.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.167-177,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
2.

国際会議録
国際会議録
2. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
出版情報: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.168-174,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4764
3.

国際会議録
国際会議録
3. Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.148-157,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148
4.

国際会議録
国際会議録
4. Reliable subnanometer repeatability for CD metrology in a reticle production environment
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.319-327,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889