ANALYSIS OF HIGH-DOSE IMPLANTED SILICON BY HIGH-DEPTH RESOLUTION RBS AND SPECTROSCOPIC ELLIPSOMETRY AND TEM
- 著者名:
Lohner, T. Mezey, G. Fried, M. Ghita, L. Ghita, C. Mertens, A. Kerkow, H. Kotai, E. Paszti, F. Banyai, F. Vizkelethy, G. Y. Jaroli, E. Gyulai, J. Somogyi, M. - 掲載資料名:
- Energy beam-solid interactions and transient thermal processing/1984 : symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 35
- 発行年:
- 1985
- 開始ページ:
- 523
- 終了ページ:
- 528
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837005 [0931837006]
- 言語:
- 英語
- 請求記号:
- M23500/35
- 資料種別:
- 国際会議録
類似資料:
Trans Tech Publications |
Trans Tech Publications |
MRS - Materials Research Society |
Materials Research Society |
Trans Tech Publications | |
Trans Tech Publications |
10
国際会議録
ANALYSIS FOR THE CHARACTERIZATION OF OXYGEN IMPLANTED SILICON (SIMOX) BY SPECTROSCOPIC ELLIPSOMETRY
Materials Research Society |
Trans Tech Publications |
Trans Tech Publications |
Trans Tech Publications |
Materials Research Society |