1.

国際会議録
国際会議録
1. A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance
Bennett, D. ; Bonner, B. ; Garretson, C. ; Huey, S. ; Jin, R. R. ; McKeever, P. ; Osterheld, T. H. ; Zuniga, S.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.63-72,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
2.

国際会議録
国際会議録
2. Removal Rate, Uniformity and Defectivity Studies Of Chemical Mechanical Polishing of BPSG Films
Bonner, B.A. ; Fishkin, B. ; David, J. ; Garretson, C. ; Osterheld, T.H.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D11.6/E8.6-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 612