1.

国際会議録
国際会議録
1. CLEANING OF METAL GATE STACKS FOR THE SUB 90 nm TECHNOLOGY NODE
Snow, J. ; Kraus, H. ; Vermeyen, K. ; Fyen, W. ; Mertens, P. ; Kovacs, F.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.393-399,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
2.

国際会議録
国際会議録
2. Gas Stream Analysis and PFC Recovery in a Semiconductor Process
Hoeymissen, J. A. B. Van ; Daniels, M. ; Anderson, N. ; Fyen, W. ; Heyns, M.
出版情報: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.55-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 447
3.

国際会議録
国際会議録
3. Modeling the Influence of Pad Bending on the Planarization Performance During CMP
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.45-50,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
4.

国際会議録
国際会議録
4. REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING
Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.
出版情報: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.91-101,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-26
5.

国際会議録
国際会議録
5. Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
出版情報: Optical Microlithography XIX.  pp.615409-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
6.

国際会議録
国際会議録
6. The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
Holsteyns, F. ; Cheung, L. ; Van Den Heuvel, D. ; Marcuccilli, G ; Simposon, G. ; Brun, R. ; Steinbach, A.. ; Fyen, W. ; Vangoidsenhoven, D. ; Merten, P. ; Maenhoudt, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152