1.

国際会議録
国際会議録
1. SILICON NITRIDE DEPOSITED AT VERY LOW SILANE PRESSURES USING ELECTRON CYCLOTRON RESONANCE PLASMAS
Flemish, J.R. ; Pfeffer, R. ; Buchwald, W. ; Jones, K.A.
出版情報: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.15-20,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 284
2.

国際会議録
国際会議録
2. RAPID PLAN VIEW FABRICATION OF SEMICONDUCTOR TEM SAMPLES FOR INTERFACE STRAIN AND GRAIN SIZE ANALYSIS
Cole, M.W. ; Flemish, J.R.
出版情報: Specimen preparation for transmission electron microscopy of materials III : symposium held December 5-6, 1991, Boston, Mass., U.S.A..  pp.233-238,  1992.  Pittsburgh.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 254
3.

国際会議録
国際会議録
3. Profile and Morphology Control During Etching of SiC Using Electron Cyclotron Resonant (ECR) Plasmas
Flemish, J.R.
出版情報: Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII).  pp.231-235,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-21
4.

国際会議録
国際会議録
4. PROPERTIES OF THICK HOMOEPITAXIAL DIAMOND LAYERS
Landstrass, M.I. ; Plano, M.A. ; McWilliams, S. ; Moreno, M.A. ; Kania, D.R. ; Pan, L.S. ; Han, S. ; Flemish, J.R.
出版情報: Proceedings of the Third International Symposium on Diamond Materials.  pp.920-926,  1993.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-17
5.

国際会議録
国際会議録
5. PHOTOREFLECTANCE AND DOUBLE CRYSTAL X-RAY STUDY OF STRAINED InGaAsP LAYERS ON InP SUBSTRATES
Flemish, J.R. ; Shen, H. ; Dutta, M. ; Jones, K.A. ; Ban, V.S.
出版情報: Long-wavelength semiconductor devices, materials, and processes : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.335-340,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 216
6.

国際会議録
国際会議録
6. SiC Power Devices for High-Temperature And High-Power Applications
Xie, K. ; Flemish, J.R. ; Burke, T. ; Bushwald, W.R.
出版情報: Proceedings of the Symposium on High Speed III-V Electronics for Wireless Applications and the twenty-fifth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXV).  pp.193-200,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-15