1.

国際会議録
国際会議録
1. Fast-etch antireflective coating for sub-0.35-ｦﾌm i-line microlithography applications
Williams,P. ; Shao,X. ; Lamb,J.E. ; Hester,C. ; Flaim,T.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.518-525,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Removable organic antireflection coating
Sturtevant,J.L. ; Insalaco,L.J. ; Flaim,T. ; Krishnamurthy,V. ; Meador,J.D. ; Petersen,J.S. ; Eckert,A.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.738-746,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724