1.

国際会議録
国際会議録
1. 193nm dual layer organic BARCS for high NA immersion lithography
Montgomery, P. K. ; Peters, R. ; Garza, C. ; Cobb, J. ; Darlington, B. ; Parker, C. ; Filipiak, S. ; Babbitt, D.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.417-435,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans
Mendicino, L. ; Brown, P.T. ; Filipiak, S. ; Nauert, C. ; Estep, H. ; Fletcher, M.
出版情報: Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium.  pp.144-156,  2002.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-15
3.

国際会議録
国際会議録
3. Integration Challenges of Inorganic Low-k (k ｡？2.5) Materials With Cu for Sub-0.25 ｦﾌm Multilevel Interconnects
Yu, K. C. ; Defilippi, J. ; Tiwari, R. ; Sparks, T. ; Smith, D. ; Olivares, M. ; Selinidis, S. ; Zhang, J. ; Junker, K. ; Braekelmann, G. ; Farkas, J. ; Lee, K. S. ; Filipiak, S. ; Lindell, M. ; Watanabe, J. K. ; Wetzel, J. T. ; Jawarani, D. ; Herrick, M. T. ; Cave, N. G. ; Hobbs, C. C.
出版情報: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.499-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 564
4.

国際会議録
国際会議録
4. Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology
Venkatraman, R. ; Jain, A. ; Farkas, J. ; Mendonca, J. ; Hamilton, G. ; Capasso, C. ; Denning, D. ; Simpson, C. ; Rogers, B. ; Frisa, L. ; Ong, T. P. ; Herrick, M. ; Kaushik, V. ; Gregory, R. ; Apen, E. ; Angyal, M. ; Filipiak, S. ; Crabtree, P. ; Sparks, T. ; Anderson, S.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.41-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
5.

国際会議録
国際会議録
5. Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
Angyal, M. ; baugh, Ash. ; D, M. ; Demkov, A. ; Filipiak, S. ; Gregory, R. B. ; Kottke, M. ; Liu, R. ; Mclntyre, L. C. ; Werho, D. ; Zollner, S.
出版情報: The optical properties of materials : symposium held November 30-December 2, 1999, Boston, Massachusetts, U.S.A..  pp.255-260,  2000.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 579
6.

国際会議録
国際会議録
6. Integration Challenges of Inorganic Low-K (K < 2.5) Materials With Cu for Sub-0.25)μm Multilevel Interconnects
Blumenthal, R. ; Braekelmann, G. ; Cave, N. G. ; Conner, J. ; Crabtree, P. ; Defilippi, J. ; Denning, D. ; Farkas, J. ; Filipiak, S. ; Fowler, B. W. ; Fox, R. ; Freeman, M. ; Garcia, S. ; Herrick, M. T. ; Hershey, R. ; Hobbs, C. C. ; Jawarani, D. ; Junker, K. ; Keyes, C. ; Kirksey, S. ; Lee, J. J. ; Lee, K. S. ; Lindell, M. ; Mora, R. ; Neil, T. ; Nguyen, T. ; Olivares, M. ; Pena, T. Newton. D. ; Selinidis, S. ; Sieloff, D. D. ; Smith, D. ; Sparks, T. ; Stankus, JJ. ; Tiwari, R. ; VanGompel, T. ; Watanabe, J. K. ; Weitzman, E. J. ; Wetzel, J. T. ; Yu, K. C. ; Zhang, J.
出版情報: Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.151-160,  1999.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 565
7.

国際会議録
国際会議録
7. Theoretical And Experimental Analysis Of The Low Dielectric Constant Of Fluorinated Silica
Demkov, A.A. ; Zollner, S. ; Liu, R. ; Werho, D. ; Kottke, M. ; Gregory, R.B. ; Angyal, M. ; Filipiak, S. ; Adams, G.B.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D3.8-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 612
8.

国際会議録
国際会議録
8. The Use Of The Four-Point Bending Technique For Determining The Strength Of Low K Dielectric/Barrier Interface
Tsui, T.Y. ; Glodberg, C. ; Braeckelmann, G. ; Filipiak, S. ; Ekstrom, B. ; Lee, J. ; Jackson, E. ; Herrick, M. ; Iacoponi, J. ; Martin, I. ; Sieloff, D.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D1.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 612