1.

国際会議録
国際会議録
1. Advances in process overlay: alignment solutions for future technology nodes
H. Megens ; R. van Haren ; S. Musa ; M. Doytcheva ; S. Lalbahadoersing ; M. van Kemenade ; H. Lee ; P. Hinnen ; F. van Bilsen
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
2.

国際会議録
国際会議録
2. Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node
A. Nackaerts ; S. Verhaegen ; M. Dusa ; H. Kattouw ; F. van Bilsen ; S. Biesemans ; G. Vandenberghe
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521