System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

著者名:

van Ingen Schenau, K. ( ASML (Netherlands) )

Rohe, T. ( Carl Zeiss (Germany) )

Emer, W.

さらに 2 件

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part One

開始ページ:

637

終了ページ:

651

総ページ数:

15

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012525
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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