1.

国際会議録
国際会議録
1. Ion-Beam Modifiction of Semiconductors and Related Electronic Materials
Elliman,R.G.
出版情報: Materials science applications of ion beam techniques : proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques, incoeporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 9-12 1996.  pp.67-72,  1997.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 248-249
2.

国際会議録
国際会議録
2. Strain Relaxation During Epitaxial Crystallization of Ge.Si1-x Alloy Layers Produced by Ion-Implantation
Elliman,R.G. ; Wong,W.C.
出版情報: Proceedings of the 17th International Conference on Defects in Semiconductors : ICDS-17, Gmunden, Austria, July 18-23, 1993.  Pt.1  pp.507-512,  1994.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 143-147