1.

国際会議録
国際会議録
1. Changes in Short- and Medium-Range Order in a-Si:H Induced by Light-Soaking, Pseudodoping and Doping With Boron
Golikova, O. A. ; Kazanin, M. M. ; Kudoyarova, V. Kh. ; Adriaenssens, G. J. ; Eliat, A.
出版情報: Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A..  pp.619-,  1999.  Warrendale.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 507
2.

国際会議録
国際会議録
2. Hydrogen's Effect on Stability of Undoped a-Si:H Under Light Soaking
Golikova, O. A. ; Kazanin, M. M. ; Kuznetsov, A. N. ; Kudoyarova, V. Kh. ; Adriaenssens, G. J. ; Grevendonk, W. ; Eliat, A.
出版情報: Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A..  pp.625-,  1999.  Warrendale.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 507
3.

国際会議録
国際会議録
3. Study of Electron Transport in a-Si:H p-i-n Diodes: Use of the Transient Space-Charge-Limited-Current Technique
Adriaenssens, G. J. ; Yan, B. ; Eliat, A.
出版情報: Amorphous silicon technology, 1995 : Symposium held April 18-21, 1995, San Francisco, California, U.S.A..  pp.443-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 377
4.

国際会議録
国際会議録
4. Status 157-nm lithography development at IMEC
Ronse, K.G. ; Bisschop, P.D. ; Eliat, A. ; Goethals, A.M. ; Hermans, J. ; Jonckheere, R. ; Heuvel, D.V.D. ; Roey, F.V. ; Beckx, S. ; Wouters, J.M. ; Marneffe, J.F. ; O'Neil, T. ; Tirri, B. ; Sewell, H.
出版情報: Optical Microlithography XVI.  Part One  pp.640-649,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
5.

国際会議録
国際会議録
5. Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
Okoroanyanwu, U. ; Stepanenko, N. ; Vereecke, G. ; Eliat, A. ; Kocsis, M.K. ; Kang, Y.S. ; Jonckheere, R.M. ; Conard, T. ; Ronse, K.G.
出版情報: Optical Microlithography XVII.  pp.487-503,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377