1.

国際会議録
国際会議録
1. Negative-tone resist for phase-shifting mask technology:a progress report
Richter,E. ; Elian,K. ; Hien,S. ; Kuhn,E. ; Sebald,M. ; Shirai,M.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.91-101,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
2.

国際会議録
国際会議録
2. Resist technologies for ion projection lithography(IPL)stencil maskmaking
Irmscher,M. ; Butschke,J. ; Elian,K. ; Hoefflinger,B. ; Kragler,K. ; Letzkus,F. ; Ochsenhirt,J. ; Reuter,C. ; Springer,R.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.362-372,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
3.

国際会議録
国際会議録
3. Optimization of the e-beam sensitive bilayer CARL process for stencil mask making
Ochsenhirt,J. ; Butschke,J. ; Letzkus,F. ; Hofflinger,B. ; lrmscher,M. ; Reuter,C. ; Springer,R. ; Elian,K.
出版情報: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.80-89,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3996