1.

国際会議録
国際会議録
1. Investigation of In-Situ Steam Generated Oxide (ISSG) followed by Remote Plasma Nitridation (RPN) for Effective Oxide Thickness Decrease and Gate Leakage Reduction
Eason, K. ; Jallepally, R. ; Noble, D. ; Hattangady, S. ; Khamankar, R. ; Rotondaro, A.L.P.
出版情報: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.195-202,  2000.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-9
2.

国際会議録
国際会議録
2. In-Line Copper Contamination Monitoring Using Non-Contact Q-V-SPV Techniques
Boehringer, M. ; Hauber, J. ; Passefort, S. ; Eason, K.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.42-49,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5133
3.

国際会議録
国際会議録
3. In-line Copper Contamination Monitoring Using Non-Contact Q-V-SPV Techniques
Bohringer, M. ; Hauber, J. ; Passefort, S. ; Eason, K.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.42-49,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-3
4.

国際会議録
国際会議録
4. In-line Electrical Metrology for High-K Gate Dielectrics Deposited by Atomic Layer Chemical Vapor Deposition
De Witte, H. ; Passefort, S. ; Besling, W. ; Maes, J.W.H. ; Eason, K. ; Youngand, E. ; Heyns, M.
出版情報: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.153-162,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-11