ANALYSIS FOR THE CHARACTERIZATION OF OXYGEN IMPLANTED SILICON (SIMOX) BY SPECTROSCOPIC ELLIPSOMETRY
- 著者名:
- 掲載資料名:
- Defects in materials : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 209
- 発行年:
- 1991
- 開始ページ:
- 493
- 終了ページ:
- 498
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991019 [1558991018]
- 言語:
- 英語
- 請求記号:
- M23500/209
- 資料種別:
- 国際会議録
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8
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Depth profile characterization of hydrogen implanted silicon using spectroscopic ellipsometry
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