Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide

Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide

著者名:

Lavoie, C.

掲載資料名:

Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

406

発行年:

1996

開始ページ:

163

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993099 [1558993096]

言語:

英語

請求記号:

M23500/406

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017052
シリーズID:	PA00000011
会議名:	Symposium on diagnostic techniques for semiconductor materials processing
回次:	2nd
会議開催地:	Boston, MA, USA
会議開催年:	1995.11.27-1995.11.30

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2 国際会議録 STRESS EVOLUTION DURING THE FORMATION AND TRANSFORMATION OF TITANIUM SILICIDE Svilan, V., Harper, J. M. E., Cabral, C., Jr., Clevenger, L. A. MRS - Materials Research Society	8 国際会議録 In-situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si Ozcan, A.S., Ludwig K.F., Jr., Lavoie, C., Cabral, C., Jr., Harper, J.M.E. Materials Research Society
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4 国際会議録 Dependence of Crystallographic Texture of C54 TiSi2 on Thickness and Linewidth in Submicron CMOS Structures Svilan, V., Rodbell, K. P., Clevenger, L. A., Cabral, C., Jr., Roy, R. A., Lavoie, C., Jordan-Sweet, J., Harper, J. M. … MRS - Materials Research Society	10 国際会議録 In-Situ Measurements During Rapid Thermal Annealing for Process Characterization Colgan, E. G., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E. MRS - Materials Research Society
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