1.

国際会議録
国際会議録
1. Recent apploaction resulta from the novel e-beam based mask repair system MeRiT MG [6281-28]
Ehrlich, C. ; Edinger, K. ; Hofmann, T. ; Degel, W.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810M-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
2.

国際会議録
国際会議録
2. Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
Van Look, L. ; Kasprowicz, B. ; Zibold, A. ; Degel, W. ; Vandenberghe, G.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
3.

国際会議録
国際会議録
3. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
4.

国際会議録
国際会議録
4. Image performance and mask characterization of 157-nm alternating phase-shifting mask
Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.
出版情報: Optical Microlithography XVI.  Part One  pp.618-628,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
5.

国際会議録
国際会議録
5. Actinic aerial image measurement for qualification of defect on 157-nm photomask
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.743-750,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
6.

国際会議録
国際会議録
6. Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]
Edinger, K. ; Boegli, V. ; Degel, W.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.361-370,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853