1.

国際会議録
国際会議録
1. Monitoring of Mobile Sodium Ions in SiQ Using Corona Charging
Stevie,F.A. ; Persson,E. ; DeBusk,D.K. ; Savchuk,A. ; Hoff,A.M. ; Edelman,P. ; Lagowski,J.
出版情報: Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.357-364,  1997.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3322
2.

国際会議録
国際会議録
2. New COCOS Method for Monitoring the Reliability of Thin Gate Oxides
Wilson,M. ; Lagowski,J. ; Sartchouk,A. ; Jastrzbski,L. ; D'Alnico,J. ; DeBusk,D.K. ; Buczkowski,A.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.373-384,  1999.  Pennington, N.J..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3895
3.

国際会議録
国際会議録
3. Sequential COCOS and SPV Metrology and Its Application to IC Process Monitoring
Hoff,A.M. ; DeBusk,D.K.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.351-364,  1999.  Pennington, N.J..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3895
4.

国際会議録
国際会議録
4. Mobile charge testing of sodium-contaminated thermal oxides using corona temperature stressing
Hoff,A.M. ; DeBusk,D.K.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing.  pp.26-34,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3215
5.

国際会議録
国際会議録
5. COCOS oxide film characterization and monitoring
Hoff,A.M. ; DeBusk,D.K. ; Schanzer,R.W.
出版情報: In-Line Methods and Monitors for Process and Yield Improvement.  pp.207-215,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3884
6.

国際会議録
国際会議録
6. Contact potential difference methods for full wafer characterization of Si/Si02 interface defects induced by plasma processing (Invited Paper)
Edelman,P. ; Savchouk,A. ; Wilson,M. ; Jastrzebski,L. ; Lagowski,J.J. ; Nauka,K. ; Ma,S. ; Hoff,A.M. ; DeBusk,D.K.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.126-136,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3509