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Effects of pattern size, dual side patterning, and imprint materials in the fabrication of antireflective structure using nanoimprint

著者名:
  • D.-G. Choi ( Korea Institute of Machinery and Materials, South Korea )
  • K. J. Lee ( Korea Institute of Machinery and Materials, South Korea )
  • K.-D. Kim ( Korea Institute of Machinery and Materials, South Korea )
  • J.-H. Choi ( Korea Institute of Machinery and Materials, South Korea )
  • J.-H. Jeong ( Korea Institute of Machinery and Materials, South Korea )
掲載資料名:
Nanoengineering : fabrication, properties, optics, and devices V : 13-14 August 2008, San Diego, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7039
発行年:
2008
開始ページ:
70391E-1
終了ページ:
70391E-9
総ページ数:
9
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472595 [081947259X]
言語:
英語
請求記号:
P63600/7039
資料種別:
国際会議録

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