1.

国際会議録
国際会議録
1. Rigorous EUV mask simulator using 2D and 3D waveguide methods
Zhu, Z. ; Lucas, K. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
出版情報: Emerging Lithographic Technologies VII.  1  pp.494-503,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5037
2.

国際会議録
国際会議録
2. Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1131-1142,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
3.

国際会議録
国際会議録
3. Estimated impact of shot noise in extreme-ultraviolet lithography
Cobb, J.L. ; Houle, F.A. ; Gallatin, G.M.
出版情報: Emerging Lithographic Technologies VII.  1  pp.397-405,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5037
4.

国際会議録
国際会議録
4. Integration of UTR processes into MPU IC manufacturing flows
Cobb, J.L. ; Dakshina-Murthy, S. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. ; Peters, R.D. ; Wu, W. ; Hector, S.D.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.277-286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
5.

国際会議録
国際会議録
5. Development and characterization of 193-nm ultra-thin resist process
Amblard, G.R. ; Peters, R. ; Cobb, J.L. ; Edamatsu, K.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.287-298,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
6.

国際会議録
国際会議録
6. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.
出版情報: Emerging Lithographic Technologies VI.  Part One  pp.481-494,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4688
7.

国際会議録
国際会議録
7. EUV photoresist performance results from the VNL and the EUV LLC
Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.
出版情報: Emerging Lithographic Technologies VI.  Part One  pp.412-420,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4688
8.

国際会議録
国際会議録
8. METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
Zhu, Z. ; Lucas, K.D. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.585-594,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
9.

国際会議録
国際会議録
9. Fabrication of integrated circuits with high yield using ultra-thin resist processes
Peters, R.D. ; Postnikov, S.V. ; Cobb, J.L. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. Jr., ; Wu, W. ; Hector, S.D.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1390-1401,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
10.

国際会議録
国際会議録
10. Controlling line-edge rougness to within reasonable limits
Cobb, J.L. ; Rauf, S. ; Thean, A. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Peters, R.D. ; Rao, V.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.376-383,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039