1.

国際会議録
国際会議録
1. TEMPERATURE DEPENDENCE OF THE KINETICS OF SILICON AMORPHIZATION BY He ION IMPLANTATION
Laanab, L. ; Roumili, A. ; Faye, M.M. ; Gessinn, N. ; Claverie, A.
出版情報: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.529-534,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 279
2.

国際会議録
国際会議録
2. TWO-DIMENSIONAL DAMAGE DISTRIBUTIONS INDUCED BY LOCALIZED ION IMPLANTATIONS
Faye, M.M. ; Laanab, L. ; Beauvillain, J. ; Claverie, A. ; Vieu, C. ; Benassayag, G.
出版情報: Microcrystalline semiconductors : materials science & devices : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.783-788,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 283
3.

国際会議録
国際会議録
3. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.
出版情報: Advances in rapid thermal processing : proceedings of the symposium.  pp.125-132,  1999.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-10
4.

国際会議録
国際会議録
4. 9 Structure and thermal evolution of small clusters found after ultralow-energy high-dose boron implantation in Si
Hebras, X. ; Cristiano, F. ; Cherkash, N. ; Lerch, W. ; Paul, S. ; Pawlalr, B. ; Surdeano, R. ; Claverie, A.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.67-82,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-14
5.

国際会議録
国際会議録
5. TEM AND HREM STUDIES OF AS-GROWN LOW-TEMPERATURE MOLECULAR BEAM EPITAXIAL In0.52Al0.48As/InP HETEROLAYERS
Claverie, A. ; Liliental-Weber, Z. ; Werner, P. ; Swider, W. ; Bhattacharya, P.K. ; Gupta, S. ; Mourou, G.
出版情報: Low temperature (LT) GaAs and related materials : symposium held December 4-6, 1991, Boston, Massachusetts, U.S.A..  pp.289-294,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 241
6.

国際会議録
国際会議録
6. Strained Silicon on Insulator Wafers Made by the Smart CutTM Technology
Ghyselen, B. ; Bogumilowicz, Y. ; Aulnette, C. ; Abbadie, A. ; Osternaud, B. ; Besson, P. ; Daval, N. ; Andrieu, F. ; Cayrefourq, I. ; Moriceau, H. ; Ernst, T. ; Tiberj, A. ; Rayssac, O. ; Blondeau, B. ; Mazure, C. ; Lagahe-Blanchard, C. ; Pocas, S. ; Cartier, A.-M. ; Hartmann, J.-M. ; Leduc, P. ; Nardo, C.Di ; Lugand, J.-F. ; Fournel, F. ; Semeria, M.-N. ; Kernevez, N. ; Campidelli, Y. ; Kermarrec, O. ; Morand, Y. ; Rivoire, M. ; Bensahel, D. ; Paillard, V. ; Vincent, L. ; Claverie, A. ; Boucaud, P.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.83-88,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
7.

国際会議録
国際会議録
7. ON THE AMORPHIZATION OF SILICON BY LIGHT ION IMPLANTATION: ION FLUX AND SUBSTRATE TEMPERATURE EFFECTS
Claverie, A. ; Roumili, A. ; Gessinn, N. ; Beauvillain, J.
出版情報: Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.369-374,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 201
8.

国際会議録
国際会議録
8. THE EARLY STAGE OF SILICON OXIDATION BY RAPID THERMAL PROCESSING: INFLUENCE OF SEVERAL PARAMETERS ON THE GROWTH KINETICS
Yahia-Messaoud, A. ; Sarrabayrouse, G. ; Claverie, A. ; Martinez, A. ; Scheid, E. ; Campo, E. ; faye, M.
出版情報: Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.391-396,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 224
9.

国際会議録
国際会議録
9. Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; van Berkum, J.G.M ; Colombeau, B. ; Claverie, A.
出版情報: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.61-72,  2000.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-9
10.

国際会議録
国際会議録
10. POINT DEFECT INJECTION IN SILICON DURING THIN OXIDE FORMATION
Skarlatos, D. ; Omri, M. ; Tsamis, C. ; Claverie, A. ; Tsoukalas, D.
出版情報: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.914-925,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-1(2)