Improved process control of photomask fabrication in e-beam lithography
- 著者名:
Cha,B.-C. Park,J.-H. Choi,Y.-H. Kim,J.-M. Han,W.-S. Yoon,H.-S. Sohn,J.-M. - 掲載資料名:
- 20th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4186
- 発行年:
- 2000
- 開始ページ:
- 508
- 終了ページ:
- 512
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- 言語:
- 英語
- 請求記号:
- P63600/4186
- 資料種別:
- 国際会議録
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5
国際会議録
Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation
SPIE-The International Society for Optical Engineering |
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