1.

国際会議録
国際会議録
1. Real-time video watermarking for MPEG streams
Kang, K.-P. ; Choi, Y.-H. ; Choi, T.-S.
出版情報: Applications of digital image processing XXVI : 5-8 August 2003, San Diego, California, USA.  pp.691-702,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5203
2.

国際会議録
国際会議録
2. Cross-search-based fast new three-step search motion estimation using temporal correlation (CFNTSS)
Kong, S.-Y. ; Choi, Y.-H. ; Choi, T.-S.
出版情報: Applications of digital image processing XXVI : 5-8 August 2003, San Diego, California, USA.  pp.711-718,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5203
3.

国際会議録
国際会議録
3. Robust and efficient scene-based watermarking using temporal spread spectrum in compressed video
Choi, Y.-H. ; Kang, K.-P. ; Choi, T.-S.
出版情報: Applications of digital image processing XXVI : 5-8 August 2003, San Diego, California, USA.  pp.737-743,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5203
4.

国際会議録
国際会議録
4. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
5.

国際会議録
国際会議録
5. Fogging effect consideration in mask process at 50-KeV e-beam systems
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.786-791,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
6.

国際会議録
国際会議録
6. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
7.

国際会議録
国際会議録
7. Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces
Choi, Y.-H. ; Sung, M.-K. ; Lee, S.-H. ; Lee, J.-H. ; Park, J.-H. ; Choi, I.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
出版情報: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.351-362,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5752
8.

国際会議録
国際会議録
8. Proximity effect correction optimization considering fogging and loading effects compensation
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.H. ; Choi, S.-W. ; Sohn, J.-M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.977-984,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689