1.

国際会議録
国際会議録
1. Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration
Choi, D.Y. ; Lee, J.H. ; Kim, D.S. ; Jung, S.T.
出版情報: Integrated Optical Devices: Fabrication and Testing.  pp.337-345,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4944
2.

国際会議録
国際会議録
2. Optical and thermomechanical properties of plasma-enhanced CVD silicon dioxide films upon annealing
Choi, D.Y. ; You, K.H. ; Guessel, S. ; Jung, S.T.
出版情報: Integrated Optics: Devices, Materials, and Technologies VIII.  pp.40-51,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5355
3.

国際会議録
国際会議録
3. Development of image and information management system for Korean standard brain
Chung, S.C. ; Choi, D.Y. ; Tack, G.R. ; Sohn, J.H.
出版情報: Medical Imaging 2004: PACS and Imaging Informatics.  pp.318-325,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5371