1.

国際会議録
国際会議録
1. Study of Slurry Chemistry in Chemical Mechanical Polishing (CMP) of Copper
Lee, Seung-Mahn ; Mahajan, Uday ; Chen, Zhan ; Singh, Rajiv K.
出版情報: Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium.  pp.187-192,  1999.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-37
2.

国際会議録
国際会議録
2. Fundamental Study of Iodine and Iodine Based Slurries for Copper CMP
Lee, Seung-Mahn ; Mahajan, Uday ; Chen, Zhan ; Singh, Rajiv K.
出版情報: Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A..  pp.E7.8-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 613
3.

国際会議録
国際会議録
3. Detection of Interfacial Structures of Poly(ethylene glycol), Poly(propylene glycol) and Their Copolymers at Liquid/Solid Interfaces Using Sum Frequency Generation Vibrational Spectroscopy
Chen, Chunyan ; Wang, Jie ; Even, Mark A. ; Chen, Zhan
出版情報: Dynamics in small confining systems - 2003 : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.149-156,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 790