1.

国際会議録
国際会議録
1. Optimization of a C2F6 Clean for an Applied Materials' TEOS PECVD Process: Reduced PFC Emissions and Faster Clean Times
Johnson, A.D. ; Entley, W.R. ; Vrtis, R.N. ; Langan, J. ; Maroulis, P. ; Chen, C.M. ; Chen, C.T. ; Chang, Y.C. ; Yam, O.H.
出版情報: Environmental issues in the electronics and semiconductor industries : proceedings of the third international symposium.  pp.21-32,  2000.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-7
2.

国際会議録
国際会議録
2. Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers
Shew, B.-Y. ; Huang, R.-S. ; Wang, D.-J. ; Perng, S.-Y. ; Kuan, C.-K. ; Cai, Y.Q. ; Chow, P.C. ; Schwoerer-Boehning, M. ; Caliebe, W. ; Kao, C.-C. ; Chen, C.T.
出版情報: Design and microfabrication of novel x-ray optics : 9 July 2002, Seattle, Wasington, USA.  pp.131-138,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4783