1.

国際会議録
国際会議録
1. Procedure for tracking damage evolution and predicting remaining useful life with application to an electromechanical experiment system
Chelidze,D. ; Cusumano,J.P. ; Chatterjee,A.
出版情報: Component and systems diagnostics, prognosis, and health management : 16-17 April 2001, Orlando, USA.  pp.12-22,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4389
2.

国際会議録
国際会議録
2. Low-Cost Parallel MCM Interconnect Test on Large Area Substrates
Sasidhar,K. ; Kim,B. ; Chatterjee,A. ; Swaminathan,M.
出版情報: 1996 International Symposium on Microelectronics : 8-10 October 1996, Minneapolis Convention Center, Minneapolis, Minnesota.  pp.218-223,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2920
3.

国際会議録
国際会議録
3. Sheet resistance requirements for the source/drain regions of 0.11-ｦﾌm gate length CMOS technology
Mehrotra,M. ; Chatterjee,A. ; Chen,I.-C
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.162-170,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
4.

国際会議録
国際会議録
4. Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper)
Hattangady,S.V. ; Grider,O.T. ; Kraft,R. ; Shiau,W.-T. ; Douglas,M.A. ; Nicollian,P. ; Rodder,M. ; Brown,G.A. ; Chatterjee,A. ; Hu,J.C. ; Aur,A. ; Tsai,H.-L. ; Chapman,R.A. ; Eklund,R.H. ; Chen,I.C. ; Pas,M.F.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.30-40,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
5.

国際会議録
国際会議録
5. Study of integration issues in shallow trench isolation for deep submicron CMOS technologies
Chatterjee,A. ; Mason,M.E. ; Joyner,K. ; Rogers,D. ; Mercer,D. ; Kuehne,J. ; Esquivel,A.L. ; Mei,P. ; Murtaza,S.S. ; Taylor,K.J. ; Ali,I. ; Nag,S. ; O'Brien,S. ; Ashburn,S.
出版情報: Microelectronic Device and Multilevel Interconnection Technology II.  pp.39-47,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2875
6.

国際会議録
国際会議録
6. Pass transistor and isolation design methodology and its implementation for improved manufacturability for 256-Mbit DRAM and beyond
Chatterjee,A. ; Rodder,M. ; Chen,I.-C.
出版情報: Microelectronic Device and Multilevel Interconnection Technology II.  pp.244-248,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2875
7.

国際会議録
国際会議録
7. Improved figure-of-merit metric for CMOS transistor performance and its application to 0.25-ｦﾌm CMOS Technologies
Chatterjee,A. ; Rodder,M. ; Chen,I.-C.
出版情報: Microelectronic Device and Multilevel Interconnection Technology.  pp.115-123,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2636