1.

国際会議録
国際会議録
1. MICROELE CTRONICS AND MICROJOINING Selection of Proper Fatigue Model for Flip Chip Package Reliability
Shin, Y.E. ; Kim, Y.S. ; Kim, H.I. ; Kim, J.M. ; Chang, K.H. ; Parson, D.F.
出版情報: New frontiers of processing and engineering in advanced materials : proceedings of the International Conference on New Frontiers of Process Scinence and Engineering in Advanced Materials : The 14th Iketani Conference, November, 24-26, 2004, held in Kyoto, Japan.  pp.393-398,  2005.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 502
2.

国際会議録
国際会議録
2. EVALUATION OF CHELATE ADDED APM CLEANING SOLUTIONS
Chung, S.P. ; Chang, K.H. ; Lee, K.T. ; Kwon, Y.M. ; Hah, S.R. ; Moon, J.T. ; Lee, S.I.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.114-120,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
3.

国際会議録
国際会議録
3. Morphology Control and Catalytic Application of Mesoporous Structures Prepared by Sol-Gel Processing
Kwon, Y.K. ; Kim, D.H. ; Chang, K.H. ; Kim, G.-J.
出版情報: Textures of materials : ICOTOM 13 : proceedings of the 13th International Conference on Textures of Materials, Seoul, Korea, August 26-30, 2002.  pp.1747-1752,  2002.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 408-412
4.

国際会議録
国際会議録
4. NBTI improvement for pMOS by Cl-contained 1st oxidation in 20A/65A dual-nitrided gate oxide of 0.13-μm CMOS technology
Hao, C.-C. ; Chi, M.-H. ; Chen, C.-C. ; Lin, H.-J. ; Lin, Y.-F. ; Hsieh, C.H. ; Lee, C.H. ; Chang, K.H. ; Wu, H.T. ; Shen, C.-H.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.180-187,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042