Goh, K ; Chen, F ; Balakumar, S. ; Higelin, G. ; See, A. ; Chan, L. ; Lin, C. ; Chern, C.
出版情報:
Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium. pp.57-70, 1999. Pennington, N. J.. Electrochemical Society
Toh, S.L. ; Loh, K.P. ; See, K.S. ; Boothroyd, O.B. ; Li, K. ; Lau, W.S. ; Ang, C.H. ; Chan, L.
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.562-568, 2005. Pennington, NJ. Electrochemical Society
Ho, C.N. ; Higelin, G. ; Low, C.H. ; See, A. ; Chan, L. ; Chua, D.H.C.
出版情報:
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium. pp.269-283, 1999. Pennington, NJ. Electrochemical Society
Lai, W. H. ; Li, M. F. ; Pan, J. S. ; Liu, R. ; Chan, L. ; Chua, T. C.
出版情報:
Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.. pp.171-, 2000. Warrendale, PA. MRS-Materials Research Society
Lee, P. S. ; Mangelinck, D. ; Pey, K. L. ; Ding, J. ; Osipowicz, T. ; Ho, C. S. ; Chen, G. L. ; Chan, L.
出版情報:
Nondestructive methods for materials characterization : symposium held November 29-30, 1999, Boston, Massachusetts, U.S.A.. pp.269-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Technologies for synthetic environments: Hardware-in-the-loop testing VIII : 21-22 April 2003, Oriando, Florida, USA. pp.259-267, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Tan, C. F. ; Lee, H. ; Liu, J. P. ; Quek, E. ; Chan, L. ; Chor, E. F.
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.554-561, 2005. Pennington, NJ. Electrochemical Society
Wong, L.H. ; Wong, C.C. ; Ferraris, C. ; White, T.J. ; Liu, J.P. ; Chan, L. ; Sohn, O.K. ; Hsia, L. C.
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.529-534, 2005. Pennington, NJ. Electrochemical Society
Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.. pp.D8.4-, 2001. Warrendale, PA. Materials Research Society
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