1.

国際会議録
国際会議録
1. Optimization of Fluorine Co-Implantation for PMOS Source and Drain Extension Formation for 65 nm Technology Node
Graoui, H. ; Hilkene, M. ; McComb, B. ; Castle, M. ; Felch, S. ; Cowern, N.E.B. ; Al-Bayati, A. ; Tjandra, A. ; Foad, M.A.
出版情報: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.247-252,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 810
2.

国際会議録
国際会議録
2. Laser Anneal Technology for Enhancement of Poly-Silicon Dopant Activation
Ma, Y. ; Ahmed, K.Z. ; Cunningham, K.L. ; Olsen, C.S. ; Leung, T.Y.B. ; Mcintosh, R.C. ; Mayur, A.J. ; Liang, H. ; Yam, M. ; Castle, M. ; Muthukrishnan, S. ; Liu, P.M. ; Foad, M. ; Miner, G.E. ; Higashi, G.S.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.230-235,  2004.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-01