1.

国際会議録
国際会議録
1. Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Ackel,R. ; Caldwell,N. ; Kindt,L. ; Racette,K.C. ; Williams,C. ; Reu,P.L.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.374-382,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
2.

国際会議録
国際会議録
2. Next-generation lithography mask development at the NGL Mask Center of Competency
Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.804-813,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
3.

国際会議録
国際会議録
3. Performance of the EL-4+ maskwriter for advanced chrome on glass reticles
Caldwell,N. ; Jeffer,R. ; Lawliss,M. ; Hartley,J.G.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.493-500,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873