1.

国際会議録
国際会議録
1. Phenolic molecular glasses as resists for next-generation lithography
X. Andre ; J. K. Lee ; A. D. Silva ; N. Felix ; C. K. Ober ; H. B. Cao ; H. Deng ; H. Kudo ; D. Watanabe ; T. Nishikubo
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
2.

国際会議録
国際会議録
2. Molecular glass resists for next generation lithography
A. De Silva ; N. Felix ; J. Sha ; J.-K. Lee ; C. K. Ober
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69231L-1-69231L-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
3.

国際会議録
国際会議録
3. The effect of EUV molecular gloss architecture on the bulk dispersion of a photo-acid generator
D. L. VanderHart ; A. De Silva ; N. Felix ; V. M. Prabhu ; C. K. Ober
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69231M-1-69231M-15,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
4.

国際会議録
国際会議録
4. Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high- resolution lithography
Y. Yi. R. Ayothi ; C. K. Ober ; W. Yueh ; H. Cao
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69231B-1-69231B-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
5.

国際会議録
国際会議録
5. Development and evaluation of 193nm immersion generation-three fluid candidates
P. A. Zimmerman ; J. Byers ; B. Rice ; C. K. Ober ; E. P. Giannelis
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69230A-1-69230A-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
6.

国際会議録
国際会議録
6. Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2
N. M. Felix ; A. De Silva ; J. Sha ; C. K. Ober
出版情報: Advances in resist materials and processing technology XXV.  2  pp.69233L-1-69233L-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
7.

国際会議録
国際会議録
7. New architectures for high resolution patterning
A. De Silva ; N. Felix ; D. Forman ; J. Sha ; C. K. Ober
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69230O-1-69230O-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923
8.

国際会議録
国際会議録
8. Development of an operational high refractive index resist for 193nm immersion lithography
P. A. Zimmerman ; J. Byers ; E. Piscani ; B. Rice ; C. K. Ober
出版情報: Advances in resist materials and processing technology XXV.  1  pp.692306-1-692306-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923