1.

国際会議録
国際会議録
1. Implications of immersion lithography on 193-nm photoresists
Taylor, J.C. ; Chambers, C.R. ; Deschner, R. ; LeSuer, R.J. ; Conley, W.E. ; Burns, S.D. ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XXI.  pp.34-43,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
2.

国際会議録
国際会議録
2. Mesoscale simulation of positive tone chemically amplified photoresists
Schmid, G.M. ; Burns, S.D. ; Stewart, M.D. ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.381-390,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry
Lin, E.K. ; Soles, C.L. ; Goldfarb, D.L. ; Trinque, B.C. ; Burns, S.D. ; Jones, R.L. ; Lenhart, J.L. ; Angelopoulos, M. ; Willson, C.G. ; Satija, S.K. ; Wu, W.-L.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.313-320,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
4.

国際会議録
国際会議録
4. Effect of humidity on deprotection kinetics in chemically amplified resists
Burns, S.D. ; Medeiros, D.R. ; Johnson, H.F. ; Wallraff, G.M. ; Hinsberg, W.D. ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.321-331,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
5.

国際会議録
国際会議録
5. Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy
Skordas, S. ; Burns, R.L. ; Goldfarb, D.L. ; Burns, S.D. ; Angelopoulos, M. ; Brodsky, C.J. ; Lawson, M.C. ; Pillette, C.J. ; Bright, J.J. ; Isaacson, R.L. ; Lagus, M.E. ; Vishnu, V.
出版情報: Advances in Resist Technology and Processing XXI.  pp.471-481,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
6.

国際会議録
国際会議録
6. Rinse additives for line-edge roughness control in 193-nm lithography
Goldfarb, D.L. ; Burns, S.D. ; Burns, R.L. ; Brodsky, C.J. ; Lawson, M.C. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XXI.  pp.343-351,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
7.

国際会議録
国際会議録
7. Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
Burns, S.D. ; Schmid, G.M. ; Trinque, B.C. ; Willson, J. ; Wunderlich, J. ; Tsiartas, P.C. ; Taylor, J.C. ; Burns, R.L. ; Wilson, C.G.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1063-1075,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
8.

国際会議録
国際会議録
8. Mesoscale modeling for SFIL simulating polymerization kinetics and densification
Burns, R.L. ; Johnson, S.C. ; Schmid, G.M. ; Kim, E.K. ; Dickey, M.D. ; Meiring, J. ; Burns, S.D. ; Stacey, N.A. ; Willson, C.G. ; Convey, D. ; Wei, Y. ; Fejes, P. ; Gehoski, K.A. ; Mancini, D.P. ; Nordquist, K.J. ; Dauksher, W.J. ; Resnick, D.J.
出版情報: Emerging Lithographic Technologies VIII.  pp.348-360,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5374