1.

国際会議録
国際会議録
1. Kinetics of the reduction of NO by C3H6 and C3H8 over Pt based catalysts under lean-burn conditions
Burch, R. ; Watling, T. C.
出版情報: Catalysis and automotive pollution control IV : proceedings of the Fourth International Symposium (CAPoC4), Brussels, Belgium, April 9-11, 1997.  pp.199-,  1998.  New York.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 116
2.

国際会議録
国際会議録
2. The Mechanisum of the Lean Nox Reaction over Pt-based Catalysts.
Ansell, G. P. ; Golunski, S. E. ; Hayes, J. W. ; Walker, A. P. ; Burch, R. ; Millington, P. J.
出版情報: Catalysis and automotive pollution control III : proceedings of the Third International Symposium (CAPoC 3), Brussels, Belgium, April 20-22, 1994.  pp.577-,  1995.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 96
3.

国際会議録
国際会議録
3. Modeling transient tracer studies of complex activation mechanisms of two-atom labelled molecules
Shestov, A. A. ; Burch, R. ; Sullivan, J. A. ; Muzykantov, V. S.
出版情報: Reaction kinetics and the development of catalytic processes : proceedings of the international symposium, Brugge, Belgium, April 19-21, 1999.  pp.447-,  1999.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 122
4.

国際会議録
国際会議録
4. A steady state isotopic transient kinetic analysis of NO reduction over Pt/SiO2 under lean burn conditions
Shestov, A. A. ; Burch, R. ; Sullivan, J. A.
出版情報: Reaction kinetics and the development of catalytic processes : proceedings of the international symposium, Brugge, Belgium, April 19-21, 1999.  pp.455-,  1999.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 122
5.

国際会議録
国際会議録
5. A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using Source/Drain and Silicide Process Modules and Their Interactions
Vasanth, K. ; Apte, P. ; Davis, J. ; Saxena, S. ; Burch, R. ; Rao, S. ; Mozumder, P. K.
出版情報: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.325-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 525
6.

国際会議録
国際会議録
6. A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using S/D and Silicide Process Modules and Their Interactions
Vasanth, K. ; Apte, P. ; Davis, J. ; Saxena, S. ; Burch, R. ; Rao, S. ; Mozumder, P. K.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.253-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514