New UV-capable photomask CD metrology tool
- 著者名:
Schlueter, G. ( Leica Microsystems Wetzlar GmbH (Germany) ) Brueck, H. -J. ( MueTec GmbH (Germany) ) Birkenmayer, S. ( MueTec GmbH (Germany) ) Falk, G. ( MueTec GmbH (Germany) ) Scheuring, G. ( MueTec GmbH (Germany) ) Walden, L. ( MueTec GmbH (Germany) ) Lehnigk, S. ( Submicron Technologies GmbH (Germany) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3748
- 発行年:
- 1999
- 開始ページ:
- 592
- 終了ページ:
- 598
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- 言語:
- 英語
- 請求記号:
- P63600/3748
- 資料種別:
- 国際会議録
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