Gate dielectric monitoring using noncontact electrical characterization

Gate dielectric monitoring using noncontact electrical characterization

著者名:

Ruzyllo,J. ( The Pennsylvania State Univ. )
Roman,P.
Lee,D.-O.
Brubaker,M.
Kamieniecki,E.

掲載資料名:

In-Line Methods and Monitors for Process and Yield Improvement

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3884

発行年:

1999

開始ページ:

198

終了ページ:

206

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434814 [0819434817]

言語:

英語

請求記号:

P63600/3884

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018101
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : In-Line Methods and Monitors for Process and Yield Improvement
回次:	1999
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.09.22-1999.09.23

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1 国際会議録 Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D., Mumbauer, P., Grant, R., Kamieniecki, E., Ruzyllo, J. Electrochemical Society	7 国際会議録 Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method Lee, D., Roman, P., Mumbauer, P., Grant, R., Horn, M., Ruzyllo, J. Electrochemical Society
2 国際会議録 Characterization of Thin Dielectric Layers using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D.D., Wang, J., Mumbauer, P., Grant, R., Tower, J., Kamieniecki, E., Lukasiak, L., Ruzyllo, aud J. Electrochemical Society	8 国際会議録 DETERMINATION OF NATIVE OXIDE REMOVAL IN CLUSTER COMPATIBLE DRY CLEANING SYSTEMS USING A SURFACE PHOTOVOLTAGE TECHNIQUE Brubaker, M., Staffa, J., Roman, P., Fakhouri, S., Ruzyllo, J. Electrochemical Society
3 国際会議録 Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E. MRS - Materials Research Society	9 国際会議録 Non-Contact Electrical Characterisation of SOI Surfaces Lukasiak, L, Roman, P, Brubaker, M, Anc, M, Ruzyllo, I Electrochemical Society
4 国際会議録 GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER Roman, P., Lee, D.-O., Wang, J., Wu, C.-T., Subramanian, V., Brubaker, M., Mumbauer, P., Grant, R., Ruzyllo, J. Electrochemical Society	10 国際会議録 STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK Chang, K., Shanmugasundaram, K., Lee, D.-O., Roman, P., Shallenberger, J., Chang, F.-M., Wang, J., Beck, R., Mumbauer, … Electrochemical Society
5 国際会議録 Process monitoring using surface charge profiling(SCP)method Ruzyllo,J., Roman,P., Staffa,J., Kashkoush,I., Kamieniecki,E. SPIE-The International Society for Optical Engineering	11 国際会議録 EFFECTS CONTROLLING INITIATION AND TERMINATION OF GAS-PHASE CLEANING REACTIONS Staffa, J., Fakhouri, S., Brubaker, M., Roman, P., Ruzyllo, J. Electrochemical Society
6 国際会議録 MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER Roman, P., Kashkoush, I., Novak, R.E., Kamieniecki, E., Ruzyllo, J. Electrochemical Society	12 国際会議録 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content Chang, K., Shallenberger, J., Chang, F.-M., Shanmugasundaram, K., Roman, P., Mumbauer, P., Ruzyllo, J. Electrochemical Society

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