1.

国際会議録
国際会議録
1. Virtual Targets Center:a working example of efficient distribution of modeling and simulation resources
Brown,S.E.
出版情報: Enabling technology for simulation science IV : 25-27 April, 2000, Orlando, USA.  pp.132-140,  2000.  Bellingham, Washington.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4026
2.

国際会議録
国際会議録
2. Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology
Subramanian,R. ; Brown,S.E. ; Chen,S.H. ; Morales,C. ; Gallardo,E. ; Singh,B.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.178-186,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
3.

国際会議録
国際会議録
3. Real-time on-wafer evaluation of contaminant-induced defects from resist processing
Lowell,J.K. ; Ackmann,P.W. ; Brown,S.E. ; Sherry,J. ; Hossain,T.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.206-216,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725
4.

国際会議録
国際会議録
4. Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-ｦﾌm i-line
Ackmann,P.W. ; Brown,S.E. ; Nistler,J.L. ; Spence,C.A.
出版情報: Optical Microlithography X.  pp.146-153,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3051
5.

国際会議録
国際会議録
5. Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design
Ackmann,P.W. ; Brown,S.E. ; Edwards,R. ; Downey,D. ; Michael,M. ; Turnquest,K. ; Nistler,J.L.
出版情報: Optical Microlithography X.  pp.384-390,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3051