1.

国際会議録
国際会議録
1. *PROPERTIES OF BURIED SiO2 FILMS IN SIMOX STRUCTURES
Revesz, A.G. ; Brown, G.A. ; Hughes, H.L.
出版情報: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.555-566,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 284
2.

国際会議録
国際会議録
2. The Gate Stack/Shallow Junction Challenge for Sub-100 nm Technology Generations *
Huff, H.R. ; Brown, G.A. ; Larson, L.A.
出版情報: ULSI Process Integration : proceedings of the International Symposium.  pp.223-249,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-2
3.

国際会議録
国際会議録
3. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
4.

国際会議録
国際会議録
4. Differentiation Between Electric Breakdowns and Dielectric Breakdown in Thin Silicon Oxides
Jackson, J.C. ; Robinson, T. ; Oralkan, O. ; Dumin, D.J. ; Brown, G.A.
出版情報: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.20-33,  1997.  Pennington, New Jersey.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-10
5.

国際会議録
国際会議録
5. * Sub-100 nm Gate Stack/Ultra Shallow Junction Integration Challenges
Huff, H.R. ; Brown, G.A. ; Larson, L.A. ; Murto, R.W.
出版情報: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.263-296,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-9
6.

国際会議録
国際会議録
6. The Search for Cathode and Anode Traps in High-Voltage Stressed Sillicon Oxides
Chen, L. ; Kang, C.S. ; Oralkan, O. ; Dumin, D.J. ; Brown, G.A. ; Bellutti, P.
出版情報: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.88-98,  1997.  Pennington, New Jersey.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-10
7.

国際会議録
国際会議録
7. Influence of the Standard CMOS Procesing on Ta2O5 Gate Dielectric Transistors Performance
Bersuker, G. ; Gilmer, M. ; Zeitzoff, P.M. ; Brown, G.A. ; Jackson, M.D. ; Shaapur, F. ; Foran, B. ; Huff, H.R.
出版情報: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.178-186,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-5
8.

国際会議録
国際会議録
8. An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate With Ozone as Oxidizer
Gutt, J. ; Brown, G.A. ; Senzaki, Yoshi ; Park, Seung
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.25-30,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
9.

国際会議録
国際会議録
9. Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance
Bersuker, G. ; Sim, J.H. ; Young, C.D. ; Choi, R. ; Lee, B.H. ; Lysaght, P. ; Brown, G.A. ; Zeitzoff, P.M. ; Gardner, M. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.31-36,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
10.

国際会議録
国際会議録
10. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811