1.

国際会議録
国際会議録
1. Resist component leaching in 193-nm immersion lithography
Chapon, J.-D. ; Chaton, C. ; Gouraud, P. ; Broekaart, M. ; Warrick, S. ; Guilmeau, I. ; Trauiller, Y. ; Belledent, J.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.95-101,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction
Pain, L. ; Charpin, M. ; Laplanche, Y. ; Herisson, D. ; Todeschini, J. ; Palla, R. ; Beverina, A. ; Leininger, H. ; Tourniol, S. ; Broekaart, M. ; Luce, E. ; Judong, F. ; Brosselin, K. ; Friec, Y.Le. ; Leverd, F. ; Medico, S.D. ; Jonghe, V.D. ; Henry, D. ; Woo, M.P. ; Arnaud, F.
出版情報: Emerging Lithographic Technologies VII.  1  pp.560-571,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5037
3.

国際会議録
国際会議録
3. Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Pain, L. ; Jurdit, M. ; LaPlanche, Y.T. ; Todeschini, J. ; Manakli, S. ; Bervin, G. ; Palla, R. ; Beverina, A. ; Faure, R. ; Bossy, X. ; Leininger, H. ; Tourniol, S. ; Broekaart, M. ; Judong, F. ; Brosselin, K. ; Gouraud, P. ; De Jonghe, V. ; Henry, D. ; Woo, M. ; Stolk, P. ; Tavel, B. ; Arnaud, F.
出版情報: Emerging Lithographic Technologies VIII.  pp.590-600,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5374