1.

国際会議録
国際会議録
1. Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin Films
Breiland, W.G. ; Brennan, T.M. ; Chui, H.C. ; Hammons, B.E. ; Killeen, K.P.
出版情報: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.261-269,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-2
2.

国際会議録
国際会議録
2. Sources of the Parasitic Chemical Reactions during AlGaN OMPVE*
Creighton, J.R. ; Breiland, W.G. ; Coltrin, M.E.
出版情報: State-of-the-art program on compound semiconductors XXXVI and wide bandgap semiconductors for photonic and electronic devices and sensors II : proceedings of the international symposia.  pp.28-35,  2002.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-3
3.

国際会議録
国際会議録
3. In-Situ Reflectance and Virtual Interface Analysis for Compound Semiconductor Process Control
Breiland, W.G. ; Hong, H.Q. ; Hammons, B.E. ; Klem, J.F.
出版情報: Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty-Eighth State-of-the-Art Program on Compound Semiconductors.  pp.311-319,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-2
4.

国際会議録
国際会議録
4. Si Atom Density Profiles In a Rotating Disk CVD Reactor
Ho, P. ; Breiland, W.G. ; Coltrin, M.E.
出版情報: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.8-12,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-2
5.

国際会議録
国際会議録
5. Laser Diagnostics and Numerical Modelling of Si Atom Density During CVD from Silane
Coltrin, M.E. ; Ho, P. ; Breiland, W.G.
出版情報: AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California.  1994.  New York.  American Institute of Chemical Engineers
シリーズ名: AIChE meeting [papers]
シリーズ巻号: 1994
6.

国際会議録
国際会議録
6. A Model for Low Pressure Chemical Vapor Deposition in Batch Furnaces
Houf, W.G. ; Grcar, J.F. ; Breiland, W.G.
出版情報: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.85-95,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-2
7.

国際会議録
国際会議録
7. In Situ Growth Rate Measurements by Normal-Incidence Reflectance During MOVPE Growth
Hou, H.Q. ; Breiland, W.G. ; Hammons, B.E. ; Chui, H.C.
出版情報: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.27-35,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-2