1.

国際会議録
国際会議録
1. Calibration of test masks used for lithography lens systems [6281-15]
Arnz, M. ; Hasler-Grohne, W. ; Bodermann, B. ; Bosse, H.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810C-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
2.

国際会議録
国際会議録
2. Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]
Gans, F. ; Liebe, R. ; Heins, Th. ; Richter, J. ; Hasler-Grohne, W. ; Frase, G. C. ; Bodermann, B. ; Czerkas, S. ; Dirscherl, K. ; Bosse, H.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810D-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
3.

国際会議録
国際会議録
3. Results of a round robin measurement on a new CD mask standard
Gans, F. ; Liebe, R. ; Richter, J. ; Schatz, Th. ; Hauffe, B. ; Hillmann, F. ; Dobereiner, S. ; Bruck, H.-J. ; Scheuring, G. ; Brendel, B. ; Bettin, L. ; Roth, K.-D. ; Steinberg, W. ; Schluter, G. ; Speckbacher, P. ; Sedlmeier, W. ; Scherubl, T. ; HaBler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Bosse, H.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.122-133,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
4.

国際会議録
国際会議録
4. Metrological characterization of new CD photomask standards
Mirande, W. ; Bodermann, B. ; Haβler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Bosse, H.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.146-154,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
5.

国際会議録
国際会議録
5. Characterizing the performance of the PTB line scale interferometer by measuring photoelectric incremental encoders [5879-08]
Koening, R. ; Ruegge, J. ; Bosse, H.
出版情報: Recent Developments in Traceable Dimensional Measurements III.  pp.587908-587908,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5879
6.

国際会議録
国際会議録
6. Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses
Haessler-Grohne, W. ; Hahm, K. ; Mirande, W. ; Bosse, H. ; Arnz, M.
出版情報: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.142-150,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4764
7.

国際会議録
国際会議録
7. Recent activities at PTB nanometer comparator
Fluegge, J. ; Koening, R. ; Bosse, H.
出版情報: Recent Developments in Traceable Dimensional Measurements II.  pp.391-399,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5190
8.

国際会議録
国際会議録
8. Line scale comparison Nano3
Bosse, H. ; Haessler-Grohne, W. ; Fluegge, J. ; Koening, R.
出版情報: Recent Developments in Traceable Dimensional Measurements II.  pp.122-133,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5190
9.

国際会議録
国際会議録
9. Development and characterization of new CD mask standards: a status report
Schaetz, T. ; Hauffe, B. ; Doebereiner, S. ; Brueck, H.-J. ; Brendel, B. ; Bettin, L. ; Roeth, K.-D. ; Steinberg, W. ; Speckbacher, P. ; Sedlmeier, W. ; Engel, T. ; Haessler-Grohne, W. ; Mirande, W. ; Bosse, H.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-53,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148
10.

国際会議録
国際会議録
10. Calibration procedures and application of the PTB photomask CD standard [5992-159]
Haβler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Ehret, G. ; Bosse, H.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992