1.

国際会議録
国際会議録
1. Effect of Cobalt and Copper Contamination on the Electrical Properties of Processed Silicon
Benton,J. ; Boone,T. ; Jacobson,D. ; Silverman,P. ; Rafferty,C. ; Weinzierl,S. ; Vu,B.
出版情報: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.278-286,  2000.  Pennington, N.J., Bellingham, Wash..  Electrochemical Society — SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4218
2.

国際会議録
国際会議録
2. Influence of oxygen precipitates on the measurement of minority carrier diffusion length in p-type silicon material using surface photovoltage technique
Ma,Y. ; Lee,J.L. ; Benton,J.L. ; Boone,T. ; Eaglesham,D.J. ; Higashi,G.S.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing.  pp.17-24,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3215