1.

国際会議録
国際会議録
1. New instrument to characterize materials and optics for 157-nm lithography
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
出版情報: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.133-143,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4404
2.

国際会議録
国際会議録
2. IR spectroscopic ellipsometry for industrial characterization of semiconductors
Boher,P. ; Bucchia,M. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.L. ; Pickering,C.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.69-78,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
3.

国際会議録
国際会議録
3. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Pickering,C. ; Tarnowka,A.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.79-89,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
4.

国際会議録
国際会議録
4. Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.P. ; Stehle,J.L.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.30-40,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
5.

国際会議録
国際会議録
5. Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays
Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Dubois,A. ; Boccara,A.C.
出版情報: Surface scattering and diffraction for advanced metrology : 1 August 2001 San Diego, USA.  pp.42-52,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4447
6.

国際会議録
国際会議録
6. High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology
Boher,P. ; Defranoux,C. ; Bourtault,S. ; Stehle,J.L.P.
出版情報: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.4-15,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3743
7.

国際会議録
国際会議録
7. New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance
Boher,P. ; Evrard,P. ; Stehle,J.L.P.
出版情報: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.104-114,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3741
8.

国際会議録
国際会議録
8. New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L.P.
出版情報: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.92-103,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3741
9.

国際会議録
国際会議録
9. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Piel,J.P. ; Evrard,P. ; Defranoux,C. ; Espinosa,M. ; Stehle,J.L.P.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.379-389,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
10.

国際会議録
国際会議録
10. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA.  pp.206-217,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4099