1.

国際会議録
国際会議録
1. Application data of the electron beam based photomask repair tool MeRiT MG
Ehrlich, C. ; Edinger, K. ; Boegli, V. ; Kuschnerus, P.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.145-154,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
2.

国際会議録
国際会議録
2. Mask repair using layout-based pattern copy for the 65-nm node and beyond [6349-52]
Boegli, V. ; Auth, N. ; Hofmann, U.
出版情報: Photomask Technology 2006.  pp.63491G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349
3.

国際会議録
国際会議録
3. Demonstration of damage-free mask repair using electron beam-induced processes
Liang, T. ; Stivers, A.R. ; Penn, M. ; Bald, D. ; Sethi, C. ; Boegli, V. ; Budach, M. ; Edinger, K. ; Spies, P.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.291-300,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
4.

国際会議録
国際会議録
4. Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]
Edinger, K. ; Boegli, V. ; Degel, W.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.361-370,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853