1.

国際会議録
国際会議録
1. PLASMA SURFACE INTERACTION DURING THE GROWTH OF SEMICONDUCTOR THIN FILMS STUDIED BY IN SITU INFRARED ELLIPSOMETRY
Blayo, N. ; Drevillon, B.
出版情報: Interface dynamics and growth : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.631-636,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 237
2.

国際会議録
国際会議録
2. New Applications of Ellipsometry for Materials Characterization and VLSI Device Process Control
Blayo, N. ; Grevoz, A. ; Lee, J.T.C. ; Ibbotson, D.E.
出版情報: Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.207-216,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-33