1.

国際会議録
国際会議録
1. STRESS GRADIENTS IN SiO2 THIN FILMS PREPARED BY THERMAL OXIDATION AND SUBJECTED TO RAPID THERMAL ANNEALING
Bjorkman, C. H. ; Fitch, J. T. ; Lucovsky, G.
出版情報: Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A..  pp.197-202,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 146
2.

国際会議録
国際会議録
2. STRAIN DEPENDENT DIFFUSION IN THE DRY THERMAL OXIDATION PROCESS OF CRYSTALLINE Si
Bjorkman, C. H. ; Lucovsky, G.
出版情報: Thin films : stresses and mechanical properties III : symposium held December 2-5, 1991, Boston, Massachusetts, U.S.A..  pp.81-86,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 239
3.

国際会議録
国際会議録
3. Chemical Stability of SC1-Cleaned Hydrogen Terminated Si(100) Surfaces
Bjorkman, C. H. ; Nishimura, H. ; Yamazaki, T. ; Alay, J. L. ; Fukuda, M. ; Hirose, M.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.177-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
4.

国際会議録
国際会議録
4. A LOW-TEMPERATURE PROCESS FOR DEVICE QUALITY Si/SiO2 INTERFACES ON Si(111)
Yasuda, T. ; Lee, D. R. ; Bjorkman, C. H. ; Ma, Y. ; Lucovsky, G. ; Emmerichs, U. ; Meyer, C. ; Leo, K. ; Kurz, H.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.375-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
5.

国際会議録
国際会議録
5. INFRARED SPECTRA OF ULTRA-THIN SiO2 GROWN ON Si SURFACES
Yamazaki, T. ; Miyazaki, S. ; Bjorkman, C. H. ; Fukuda, M. ; Hirose, M.
出版情報: Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.419-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 318
6.

国際会議録
国際会議録
6. Valence Band Alignment of Ultra-Thin SiO2/Si Interfaces as Determined by High Resolution X-ray Photoelectron Spectroscopy
Alay, J. L. ; Fukuda, M. ; Bjorkman, C. H. ; Nakagawa, K. ; Sasaki, S. ; Yokoyama, S. ; Hirose, M.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.249-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386