3D simulation of thin film growth conditions at ion beam sputter deposition and comparison to experimental investigations

3D simulation of thin film growth conditions at ion beam sputter deposition and comparison to experimental investigations

著者名:

Tilsch,M. ( Technische Hochschule Darmstadt )
Scheuer,V.
Biersack,J.
Tschudi,T.T.

掲載資料名:

Specification, Production, and Testing of Optical Components and Systems

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2775

発行年:

1996

巻:

Part2

開始ページ:

585

終了ページ:

593

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421609 [081942160X]

言語:

英語

請求記号:

P63600/2775

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018873
シリーズID:	PA00000029
会議名:	Optical Instrumentation & System Design : Specification,Production,and Testing of Optical Components and Systems
回次:	1996
会議開催地:	Glasgow, Scotland, UK
会議開催年:	1996.05.13-1996.05.16

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