1.

国際会議録
国際会議録
1. Ultrashallow Junction Formation And Gate Activation In Deep-Submicron CMOS
Stolk, Peter A. ; Cubaynes, Florence N. ; Meyssen, Veerle ; Mannino, Giov'anni ; Cowern, Nicholas E.B. ; Zijl, Jeroen van ; Roozeboom, Fred ; Verhoeven, Jan ; Berkum, Jurgen van ; Wijgert, Willem van de ; Schmitz, Jurriaan ; Tuinhout, Hans ; Woerlee, Pierre
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B3.1-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
2.

国際会議録
国際会議録
2. Shallow Junctions for Sub-100 nm CMOS Technology
Meyssen, Veerle ; Stolk, Peter ; Zijl, Jeroen van ; Berkum, Jurgen van ; Wijgert, Willem van de ; Lindsay, Richard ; Dachs, Charles ; Mannino, Giovanni ; Cowern, Nick
出版情報: Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 669